您現(xiàn)在位置：首頁(yè)>產(chǎn)品中心>Logitech精密材料表面處理>化學(xué)拋光設(shè)備>CP4000化學(xué)拋光機(jī)
 |
CP4000化學(xué)拋光機(jī)
- 瀏覽次數(shù)：5469
- 更新時(shí)間：2025-12-05
產(chǎn)品簡(jiǎn)介：
Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require ......
Chemicals typically used in prime face polishing of semiconductor wafers or electronic and optoelectronic crystals, such as Bromine Methanol or acid etches, are highly aggressive and require the use of specialised corrosive resistant equipment.
The CP4000 has been designed exactly for this application, and utilises a chemical etch polishing process to produce high quality results with minimal subsurface damage.
Ø Corrosive Resistant Construction
Ø Workdecks
Ø Polishing Plate
Ø Industry Standard System Architecture
上一個(gè):CMP Orbis柜式化學(xué)機(jī)械研磨拋光設(shè)備 下一個(gè):AWS1線切割機(jī)
